Major 

Material Science and Engineering
 
 
 Research Interests

Energy materials
Surface treatment and thin film deposition
Semiconductor materials
  
 
 Education 

Colorado School of Mines
Dept. of Metallurgical & Materials Engineering
Ph. D., December, 1997

Colorado School of Mines
Dept. of Metallurgical & Materials Engineering
M. S., June, 1994

Hanyang University
Dept. of Materials Engineering
B. S. Feb., 1991
 
 
 Selected Publications 
  Barrier Characteristics of TaN Films Deposited by Using the Remote Plasma Enhanced Atomic Layer Deposition Method
Ju Youn Kim, Keun Woo Lee, Hee Ok Park, Yangdo Kim, Young Do Kim, Hyeongtag Jeon
J. Korean phys. Soc., Vol.45(4) pp.1069-1073, Oct 2004 (SCI)

Effects of Mn addition on microstructure and mechanical properties of (Al+x at.%Mn)3Ti intermetallic compounds prepared by mechanical alloying and spark plasma sintering
Hee Sup Jang, Chang Won Kang, Yangdo Kim, Kyung Tae Hong and Seon-Jin Kim
Intermetallics, Vol. 12, pp. 477-485, 2004 (SCI)

Removal of the Metallorgainc Polymer Residues Formed at Via Holes
Jongkook Song, Jong-Soo Kim, Hyuntak Seo, Yangdo Kim and Hyeongtag Jeon
J. of the Electrochemical Society, Vol 151 (5), pp. G322-G326, 2004 (SCI)

Surface resistance and field emission current on chemically vapor deposited polycrystalline diamond measured by scanning probe methods
Y. Iseri, M. Honda, Y-D Kim, T. Ando, W. Choi and H. Tomokage
J. Phys.: Condens. Matter, Vol. 16, pp. S171-S179, 2004 (SCI)
Effects of Pre-Strain and Aging Treatment on the Mechanical Properties of 1.0wt.% Cu Containing Hot Rolled Steel Sheet
In-Gon Kim, Yangdo Kim and In-bae Kim
Materials Science Forum (Designing, Processing and Properties of Advanced Engineering Materials ISAEM 2003), pp. 517-520, 2004 (SCI)

Electrochemical kinetics study of electroless copper plating for electronics applications
Dae-Geun Kim, Jin-Soo Bae, Jae-Ho Lee, Yangdo Kim and Yoomin Ahn
Materials Science Forum (Designing, Processing and Properties of Advanced Engineering Materials ISAEM 2003), pp. 393-396, 2004 (SCI)

Characteristics of ZrO2/Al2O3 bilayer film for gate dielectric applications deposited by atomic layer deposition method
Yangdo Kim, Janghee Lee, Jaehyoung Koo and Hyeongtag Jeon
Materials Science Forum (Designing, Processing and Properties of Advanced Engineering Materials ISAEM 2003), pp. 497-500, 2004 (SCI)

Plasma enhanced atomic layer deposition of HfO2 gate dielectric
Sungwoo Choi, Jaehyoung Koo, Hyeongtag Jeon, Yangdo Kim and Chan-Kyung Park
J. Korean phys. Soc., Vol. 44 (1), pp. 35-38, 2004 (SCI)

Remote plasma enhanced atomic layer deposition (PEALD) of TiN thin films using metal organic precursor
Ju Youn Kim, Sangwon Seo, Do Youl Kim, Yangdo Kim and Hyeongtag Jeon
J. Vac. Sci. Technol. A 22 (1), pp. 8-12, Jan/Feb 2004 (SCI)

Development of a low power static random access memory with a spacer-on-stopper structure using Co salicide
Joo Young Kim, Ju Youn Kim, Hyeongtag Jeon, Sung Jin Kim, Yangdo Kim, ChongmuLee and Namchul Kim
J. Korean phys. Soc., Vol. 43 (5), pp. 802-806, 2003 (SCI)

Microstructure effects on the high-temperature oxidation resistance of DC sputtered Ti-Si-N coating layers
Jun Bo Choi, Kurn Cho, Yangdo Kim, Kwang Ho Kim and Pung Keon Song
Jpn. J. Appl. Phys., Vol. 42, Part 1 No. 10, pp. 6556-6559, 2003 (SCI)

Study on the cavitation erosion behavior of hardfacing alloys for nuclear power industry
Min-wooLee, Yoon-kab Kim, Young-min Oh, Yangdo Kim, Sung-hoon Lee, Hyun-seong Hong and Seon-jin Kim
Wear, Vol. 255, Issues 1-6, pp. 157-161, 2003 (SCI)
The effects of additive elements on the sliding wear behavior of Fe-base hardfacing alloys
Kwon-yeong Lee, Sung-hoon Lee, Yangdo Kim, Hyun-seng Hong, Young-min Oh and Seon-jin Kim
Wear, Vol. 255, Issues 1-6, pp. 481-488, 2003 (SCI)

Comparison of TiN films deposited using TDMAT and TDEAT by atomic layer deposition method
Ju Youn Kim, Gil Heyun choi,Young Do Kim, Yangdo Kim and Hyeongtag Jeon
Jpn. J. Appl. Phys., Vol. 42, Part 1 No. 7A, pp. 4245-4248, 2003 (SCI)

Low temperature growth of carbon nanotube by plasma enhanced chemical vapor deposition using nickel catalyst
Kyoungmin Ryu, Mihyun Kang, Yangdo Kim and Hyeongtag Jeon
Jpn. J. Appl. Phys., Vol. 42, Part 1 No. 6A, pp. 3578-3581, 2003 (SCI)

Comparison of TiN and TiN/Ti/TiN multilayer films for diffusion barrier application
Jin Yong Park, Ju Youn Kim, Yangdo Kim, Young Do Kim, and Hyeongtag Jeon
J. Korean phys. Soc., Vol. 42 (6), pp. 817-820, 2003 (SCI)

Characteristics of TiN films deposited by remote plasma enhanced atomic layer deposition (PEALD) method
Ju Youn Kim, Yangdo Kim and Hyeongtag Jeon
Jpn. J. Appl. Phys. Vol. 42, Part 2 No. 4B, pp. L414-L416, 2003 (SCI)

Characteristics of TiN films deposited by remote plasma enhanced atomic layer deposition (PEALD) method
Ju Youn Kim, Yangdo Kim and Hyeongtag Jeon
Jpn. J. Appl. Phys. Vol. 42, Part 2 No. 4B, pp. L414-L416, 2003 (SCI)

Removal of the polymer formed at via hole with via etching stopped on an Al layer structure
Jongkook Song, Jong-Soo Kim, Hyungtak Seo, Yangdo Kim and Hyeongtag Jeon
Jpn. J. Appl. Phys. Vol. 42, Part 1 No. 3A, pp. 1216-1221, 2003 (SCI)

Metal organicatomic layer deposition of TiN films using TDMAT and NH3
Hyo Kyeom Kim, Ju Youn Kim, Jin Yong Park, Yangdo Kim, Won Mok Kim, Young do Kim and Hyeongtag Jeon
J. Korean phys. Soc., Vol. 41 (5), pp. 739-744, 2002 (SCI)

Characterization of ZrO2 gate dielectric deposited using Zr t-butooxide and Zr(Net2)4 precursors by plasma enhanced atomic layer deposition method
Yangdo Kim, Jaehyoung Koo, Jiwoong Han, Sungwoo Choi, Hyengtag Jeon and Chan Gyung Park
J. of Appl. Phys., Vol. 92 (9), pp. 5443-5447, Nov. 2002 (SCI)

Remote RF oxygen cleaning of the photoresist residue and RIE-related fluorocarbon films
Sung Bae Kim, Hyungtak Seo, Yangdo Kim, Hyeongtag Jeon, Jongkook Song Hyun Soh* and Young Chai Kim
J. Korean phys. Soc., Vol. 41 (2), pp. 247-250, 2002 (SCI)

Low temperature remote plasma cleaning of the fluorocarbon and polymerized residues formed during contact hole dry etching
Hyungtak Seo, Sung Bae Kim, Jongkook Song, Yangdo Kim, Hyun Soh*, Young Chai Kim and Hyeongtag Jeon
J. Vac. Sci. Technol. B 20(4), pp. 1548-1555, Jul/Aug 2002 (SCI)

Analysis of Ti-silicide Formation with Thin Ta Interlayer on Si (100)
Hyeongtag Jeon, Heykyoung Won, Yangdo Kim, Jaeseob Lee and R.J.Nemanich
J. Korean phys. Soc., Vol. 40 (5), pp. 903-907, 2002 (SCI)

Field-Emission Activation on Boron-doped Chemical-Vapor-Deposited Polycrystalline Diamond Films
Y. D. Kim, W. Choi, C. H. Wang, T. Ando, H. Jeon, S. Y. Chang and H. Tomokage
Jpn. J. Appl. Phys. Vol. 41, Part 1 No. 5A, pp. 3081-3084, 2002 (SCI)

ZrO2 Gate Dielectric Deposited by Plasma Enhanced Atomic Layer Deposition Method
Jaehyoung Koo, Yangdo Kim and Hyeongtag Jeon
Jpn. J. Appl. Phys. Vol. 41, Part 1 No. 5A, pp. 3043-3046, 2002 (SCI)

Comparison of TiN and TiAlN as a diffusion barrier deposited by atomic layer deposition method
Ju Youn Kim, Hyo Kyeom Kim, Yangdo Kim, Young Do Kim and Hyeongtag Jeon
J. Korean phys. Soc. Vol. 40 (1), pp. 176-179 Jan 2002 (SCI)

In-situ Hydrogen and Oxygen Plasma Purification of Carbon Nanotubes
Mihyun Kang, Yangdo Kim and Hyeongtag Jeon
J. Korean phys. Soc. Vol. 39 (6), pp. 1072-1075, Dec 2001 (SCI)

A study on the characteristics of TiAlN thin film deposited by atomic layer deposition method
Jaehyoung Koo, June-Woo Lee, Taehan Doh, Yangdo Kim, Young-Do Kim and Hyeongtag Jeon
J. Vac. Sci. Technol. A 19 (6), pp. 2831-2834, Nov/Dec 2001 (SCI)

Field emission characteristics of plasma enhanced chemical vapor deposited diamond-like carbon films using scanning probe measurements
W. Choi, E. R. Hwang, N. Nomura, S. Itose, Y. Iseri, T. Ando, Y. D. Kim, and H.Tomokage
Solid State Phenomena, Vol. 78-79, pp. 191-196, 2001 (SCI)

Scanning probe field emission current measurements on polycrystalline diamond films
H. Wakimoto, H. Tomokage, Y. D. Kim, W. Choi, Y. Iseri, and T. Ando
Solid State Phenomena, Vol. 78-79, pp. 177-182, 2001 (SCI)

Spatial variation of field emission current on nitrogen doped diamond-like carbon surfaces by scanning probe method
W. Choi, Y. D. Kim, Y. Iseri, N. Nomura, and H Tomokage
Diamond and Related Materials, Vol. 10, pp. 863-867, 2001 (SCI)

Characterization of boron-doped polycrystalline CVD diamond by ultra high vacuum STM
Y. D. Kim, W. Choi, H. Wakimoto, S. Usami, H. Tomokage, and T. Ando
J. of Diamond and Related Materials, Vol9, pp. 1096-1099, 2000 (SCI)

Direct observation of electron emission site on boron-doped polycrystalline diamond thin films using ultra high vacuum STM
Y. D. Kim, W. Choi, H. Wakimoto, S. Usami, H. Tomokage, and T. Ando
J. of Applied Physics Letter, Vol. 75, No. 20, pp. 3219-3221, 1999 (SCI)

Analysis of transient currents due to the electron beam irradiation to boron-doped homoepitaxial diamond films
H. Tomokage, H. Sato, S. Usami, Yangdo Kim, H. Kiyota and T. Ando
Diamond Related Materials, Vol. 8, pp. 892-896, 1999 (SCI)

Low-Firing Lead Magnesium Niobate Lead Titanate Lead Germanium Silicate Ferroelectric Compositions for Thick Film Capacitor Applications
Y. D. Kim and M. J. Haun
International Journal of Microcircuits and Electronic Packaging, Issue 2, Vol. 22, No. 2, 1999 (SCI)
  
 
 Professional Experiences 

Research fellow, Fukuoka IST (1998.02.-2000.01.)

BK21 Research professor, Division of Materials Science and Engineering, Hanyang University (2000.02.- 2003.02.)

Assistant professor, School of Material Science and Engineering,
Pusan National University, Korea (2003-Present)
  
 
 Professional Societies & Activities 

KIM : regular member (2000-present)
MRS-K : regular member (2000-present)
KPMI : regular member (2000-present)
  
 
 Honors and Awards 

  
 
 International Joint Research & Activities 

Microelectronics Assembling and Packaging : International committee (MAP2002 & MAP2003)

AVS Topical Conference ALD2002 : International Steering Committee (2002-present)

JSEM : International Steering Committee(1998-present)